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| The ultra-high resolution Focused Ion Beam system (FIB) (Helios Nanolab 600, see picture below) is used for 3D materials characterization, failure analysis and characterization of nano-characterization. The electron optics has a resolution of 0.9 nm and 1.4 nm @ 15kV @ 1kV and has an ultra-high-brightness field emission source with a magnetic immersion lens and is equipped with SE and RE Inlens detectors. The ion optics has a resolution of 5 nm @ 30 kV. By using the ResolveRT software package we have possibility to create 3-dimensional images by reconstruct 2-dimsionalen sections. 
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