Prof. Dr. rer. nat. habil. Xin Jiang
Chair of Surface and Materials Technology
Institute of Materials Engineering
University of Siegen
Head of the Chair of Surface and Materials Technology
Thin films technology, surface- and interface-phenomena, nano-materials, thin film applications
since April 2003
Head of the Chair of Surface and Materials Technology at the University of Siegen
2000 - 2003
Senior Scientist at the Fraunhofer IST in Braunschweig, Germany
Habilitation in the field of "Materials Science" at the
Technical University of
Braunschweig, Germany, degree: Dr. rer. nat. habil..
Habilitation-thesis: Nucleation, growths, and properties of heteroepitactic diamond-films, deposited from the gas-phase.
1991 - 2000
Scientist and project-manager at the Fraunhofer IST in Braunschweig, Germany
Promotion (PhD) at the University of Aachen,
Germany, degree: Dr. rer. nat. Dissertation-thesis:
Analysis of the mechanical properties of a-C:H- and
a-Si:H-films by Brillouin-scattering and nanoindentation.
The work was carried out at the Institute of Solid State Physics (IFF, now: Peter Grünberg Institute (PGI)) and the Institute of Film and Ion Technology (ISI) at the Research Centre Jülich (FZJ formerly KFA), Germany
1988 - 1990
Research Assistant at the Institute of Film and Ion Technology (ISI) at the Research Centre Jülich (FZJ formerly KFA), Germany
1987 - 1988
1983 - 1986
Master of Science program at the Institute of Metal
Research (CAS), Shenyang, China.
Thesis title: Scanning-electron-microscopy studies of the micro- and interface-structure of ionplated Titanium Nitride films.
1978 - 1983
Bachelor of Science program in the area of semi-conductors and materials science at the Jilin University, China